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通过光化学硫醇-烯反应在硅(100)上共价逐层组装氧化还原活性分子多层膜。

Covalent layer-by-layer assembly of redox active molecular multilayers on silicon (100) by photochemical thiol-ene chemistry.

机构信息

Organic Chemistry Institute and Center for Nanotechnology (CeNTech), Westfälische Wilhelms-Universität Münster, Corrensstrasse 40, 48149 Münster, Germany.

出版信息

Small. 2012 Feb 20;8(4):569-77. doi: 10.1002/smll.201101822. Epub 2011 Dec 20.

DOI:10.1002/smll.201101822
PMID:22183873
Abstract

The fabrication of thin organic films covalently grafted onto silicon substrates is of significant interest, as they are expected to give access to a broad range of new materials for integration into microelectronic applications. Covalent layer-by-layer (LbL) assembly offers a high degree of freedom when designing such thin films. In this work an approach for the preparation of covalent redox active molecular multilayers on silicon (100) surfaces is presented using a highly branched decaallylferrocene and thiol-ene click chemistry. The multilayers are analyzed by ellipsometry, X-ray photoelectron sprectroscopy, and cyclic voltammetry. The results indicate that the multilayer growth is linear for at least sixteen layers and the density of ferrocenes per layer is in the range of 6 × 10⁻¹¹ mol cm⁻². Moreover, this method for LbL assembly is extended to surfaces which have been locally passivated by microcontact printing. By atomic force microscopy measurements it is possible to show that the covalent LbL deposition proceeds exclusively in the nonpassivated areas.

摘要

将共价接枝到硅衬底上的有机薄膜的制备具有重要的意义,因为它们有望为微电子应用集成提供广泛的新材料。共价层层自组装(LbL)在设计这种薄膜时提供了高度的自由度。在这项工作中,使用高度支化的十烯丙基二茂铁和硫醇-烯点击化学,提出了在硅(100)表面制备共价氧化还原活性分子多层的方法。通过椭圆光度法、X 射线光电子能谱和循环伏安法对多层进行了分析。结果表明,多层生长至少为十六层线性,每层的二茂铁密度在 6×10⁻¹¹ mol cm⁻²范围内。此外,这种 LbL 组装方法还扩展到了通过微接触印刷局部钝化的表面。通过原子力显微镜测量,可以证明共价 LbL 沉积仅在未钝化区域进行。

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