通过非传统两步压印法制备分级结构。

Fabrication of hierarchical structures by unconventional two-step imprinting.

机构信息

State Key Laboratory of Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, PR China.

出版信息

J Colloid Interface Sci. 2012 Feb 15;368(1):655-9. doi: 10.1016/j.jcis.2011.11.042. Epub 2011 Dec 8.

DOI:10.1016/j.jcis.2011.11.042

PMID:22206968

Abstract

We present a simple sequential imprinting lithography method to fabricate micro/nanoscale hierarchical structures. This method involves hot embossing and capillary force lithography with two stamps of different microscales, which avoids using nanoscale stamps. By varying the experimental conditions in the capillary force lithography process, the morphology of the resulting structures can be controlled. This method may provide a facile and low-cost route for fabricating large area patterns of hierarchical structures.

摘要

我们提出了一种简单的顺序压印光刻方法来制造微/纳尺度的分层结构。该方法涉及热压印和具有不同微尺度的两个印章的毛细作用力光刻，避免使用纳米尺度的印章。通过改变毛细作用力光刻过程中的实验条件，可以控制所得结构的形态。该方法可能为制造大面积分层结构图案提供一种简单且低成本的途径。