Kang Min-Seok, Ahn Jung-Joon, Moon Kyoung-Sook, Koo Sang-Mo
Department of Electronic Materials Engineering, Kwangwoon University, 447-1 Wolgye-dong, Nowon-gu, Seoul, 139-701, South Korea.
Nanoscale Res Lett. 2012 Jan 13;7(1):75. doi: 10.1186/1556-276X-7-75.
Metal, typically gold [Au], nanoparticles [NPs] embedded in a capping metal contact layer onto silicon carbide [SiC] are considered to have practical applications in changing the barrier height of the original contacts. Here, we demonstrate the use of silver [Ag] NPs to effectively lower the barrier height of the electrical contacts to 4H-SiC. It has been shown that the barrier height of the fabricated SiC diode structures (Ni with embedded Ag-NPs) has significantly reduced by 0.11 eV and 0.18 eV with respect to the samples with Au-NPs and the reference samples, respectively. The experimental results have also been compared with both an analytic model based on Tung's theory and physics-based two-dimensional numerical simulations.
嵌入在碳化硅(SiC)上的覆盖金属接触层中的金属(通常是金[Au])纳米颗粒(NPs)被认为在改变原始接触的势垒高度方面具有实际应用价值。在此,我们展示了使用银(Ag)纳米颗粒有效地降低与4H-SiC的电接触的势垒高度。结果表明,相对于具有金纳米颗粒的样品和参考样品,所制备的SiC二极管结构(嵌入银纳米颗粒的镍)的势垒高度分别显著降低了0.11电子伏特和0.18电子伏特。实验结果还与基于董氏理论的解析模型和基于物理的二维数值模拟进行了比较。