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UV 和 UV/H2O2 工艺去除阿莫西林。

Removal of amoxicillin by UV and UV/H2O2 processes.

机构信息

Department of Environmental Engineering, YIEST, Yonsei University, 234 Maeji, Heungup, Wonju, 220-710, Republic of Korea.

出版信息

Sci Total Environ. 2012 Mar 15;420:160-7. doi: 10.1016/j.scitotenv.2011.12.011. Epub 2012 Feb 10.

Abstract

The degradation of the β-lactam antibiotic amoxicillin (AM) treated with direct UV-C and UV/H(2)O(2) photolytic processes was investigated in the present study. In addition, the antibacterial activity of the solution treated by UV/H(2)O(2) advanced oxidation was compared with AM solution treated with ozone. The degradation rate of amoxicillin in both processes fitted pseudo first-order kinetics, and the rates increased up to six fold with increasing H(2)O(2) addition at 10mM H(2)O(2) compared to direct photolysis. However, low mineralization was achieved in both processes, showing a maximum of 50% TOC removal with UV/H(2)O(2) after a reaction time of 80min (UV dose: 3.8×10(-3)EinsteinL(-1)) with the addition of 10mM H(2)O(2). The transformation products formed during the degradation of amoxicillin in the UV and UV/H(2)O(2) processes were identified by LC-IT-TOF analysis. In addition, microbial growth inhibition bioassays were performed to determine any residual antibacterial activity from potential photoproducts remaining in the treated solutions. An increase of the antibacterial activity in the UV/H(2)O(2) treated samples was observed compared to the untreated sample in a time-based comparison. However, the UV/H(2)O(2) process effectively eliminated any antibacterial activity from AM and its intermediate photoproducts at 20min of contact time with a 10mM H(2)O(2) dose after the complete elimination of AM, even though the UV/H(2)O(2) advanced oxidation process led to bioactive photoproducts.

摘要

本研究考察了直接 UV-C 和 UV/H(2)O(2)光解过程处理β-内酰胺抗生素阿莫西林(AM)的降解情况。此外,还比较了 UV/H(2)O(2)高级氧化处理溶液的抗菌活性与臭氧处理 AM 溶液的抗菌活性。两种过程中阿莫西林的降解速率均符合伪一级动力学,与直接光解相比,在 10mM H(2)O(2)下,H(2)O(2)的加入使速率增加了六倍。然而,两种过程的矿化程度都较低,在 80min 的反应时间(UV 剂量:3.8×10(-3)EinsteinL(-1))后,UV/H(2)O(2)仅能去除 50%的 TOC,添加 10mM H(2)O(2)。通过 LC-IT-TOF 分析鉴定了 AM 在 UV 和 UV/H(2)O(2)过程中降解形成的转化产物。此外,还进行了微生物生长抑制生物测定,以确定处理溶液中残留的潜在抗菌活性的光产物。与未处理样品相比,在基于时间的比较中,UV/H(2)O(2)处理样品的抗菌活性增加。然而,在 20min 的接触时间内,即使 UV/H(2)O(2)高级氧化过程产生了具有生物活性的光产物,在添加 10mM H(2)O(2)后,UV/H(2)O(2)处理也能有效消除 AM 及其中间光产物的抗菌活性,并且 AM 完全消除。

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