Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, Korea.
Adv Mater. 2012 Apr 24;24(16):2069-103. doi: 10.1002/adma.201104826. Epub 2012 Mar 27.
This review demonstrates directional photofluidization lithography (DPL), which makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods. In particular, DPL differs from many of the existing micro/nanofabrication methods in that the post-treatment (i.e., photofluidization), after the preliminary fabrication process of the original micro/nanostructures, plays a pivotal role in the various micro/nanostructural evolutions including the deterministic reshaping of architectures, the reduction of structural roughness, and the dramatic enhancement of pattern resolution. Also, DPL techniques are directly compatible with a parallel and scalable micro/nanofabrication. Thus, DPL with such extraordinary advantages in micro/nanofabrication could provide compelling opportunities for basic micro/nanoscale science as well as for general technology applications.
本文综述了定向光流液化光刻（DPL），该技术可用于制造通用且复杂的微/纳结构，而这是其他方法难以或不可能实现的。特别是，DPL 与许多现有的微/纳米制造方法不同，在原始微/纳米结构的初步制造过程之后，后处理（即光流液化）在各种微/纳米结构演变中起着关键作用，包括结构的确定性重塑、结构粗糙度的降低以及图案分辨率的显著提高。此外，DPL 技术与并行和可扩展的微/纳米制造直接兼容。因此，DPL 在微/纳米制造方面具有如此卓越的优势，可为基础微纳米科学以及一般技术应用提供极具吸引力的机会。
