U.S. Naval Research Laboratory, Center for Bio/Molecular Science & Engineering, Code 6910, 4555 Overlook Avenue S.W., Washington, DC 20375, USA.
ACS Appl Mater Interfaces. 2012 May;4(5):2358-68. doi: 10.1021/am3006934. Epub 2012 May 7.
We describe a process for selective metallization of paper substrates bearing inkjet printed patterns of a commercial Pd/Sn colloidal catalyst ink plated using a commercial electroless Cu bath. The electrical conductivity of the Cu films is analyzed as a function of feature geometry (line dimensions (L) and spacing (S)), type of paper (P), age of the Pd/Sn patterns (A), plating time (T), and plating temperature (H) using a two-level factorial design. Conductivity is influenced predominantly by the P, T, and H factors, with lesser contributions attributed to pair-wise interactions among several of the variables studied. Increases in T and/or H enhance conductivity of the Cu films, whereas increases in P, corresponding to the use of rougher, more porous, paper substrates, yield Cu films exhibiting decreased conductivity. Our analysis leads to a model that predicts Cu film conductivity well over the ranges of variables examined, provides guidelines for identification of optimum conditions for plating highly conductive Cu films, and identifies areas for further process improvement.
我们描述了一种选择性金属化的过程,该过程适用于在喷墨打印有商业 Pd/Sn 胶体催化剂图案的纸基板上进行电镀,所使用的催化剂图案是通过商业化学镀铜浴镀上的。通过使用两水平析因设计,分析了 Cu 膜的电导率作为特征几何形状(线尺寸(L)和间距(S))、纸张类型(P)、Pd/Sn 图案的老化(A)、电镀时间(T)和电镀温度(H)的函数。电导率主要受 P、T 和 H 因素的影响,而几个研究变量之间的相互作用则贡献较小。T 和/或 H 的增加会提高 Cu 膜的电导率,而 P 的增加(对应于使用更粗糙、更多孔的纸张衬底)会导致 Cu 膜的电导率降低。我们的分析得出了一个模型,该模型很好地预测了在研究变量范围内的 Cu 膜电导率,为确定电镀高导电性 Cu 膜的最佳条件提供了指导,并确定了进一步改进工艺的领域。