Wan Abdullah Wan Rafizah, Zakaria Azmi, Ghazali Mohd Sabri Mohd
Advanced Materials and Nanotechnology Laboratory, Institute of Advanced Technology, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia.
Department of Physics, Faculty of Science, Universiti Putra Malaysia, 43400 UPM Serdang, Selangor, Malaysia.
Int J Mol Sci. 2012;13(4):5278-5289. doi: 10.3390/ijms13045278. Epub 2012 Apr 24.
High demands on low-voltage electronics have increased the need for zinc oxide (ZnO) varistors with fast response, highly non-linear current-voltage characteristics and energy absorption capabilities at low breakdown voltage. However, trade-off between breakdown voltage and grain size poses a critical bottle-neck in the production of low-voltage varistors. The present study highlights the synthesis mechanism for obtaining praseodymium oxide (Pr(6)O(11)) based ZnO varistor ceramics having breakdown voltages of 2.8 to 13.3 V/mm through employment of direct modified citrate gel coating technique. Precursor powder and its ceramics were examined by means of TG/DTG, FTIR, XRD and FESEM analyses. The electrical properties as a function of Pr(6)O(11) addition were analyzed on the basis of I-V characteristic measurement. The breakdown voltage could be adjusted from 0.01 to 0.06 V per grain boundary by controlling the amount of Pr(6)O(11) from 0.2 to 0.8 mol%, without alteration of the grain size. The non-linearity coefficient, α, varied from 3.0 to 3.5 and the barrier height ranged from 0.56 to 0.64 eV. Breakdown voltage and α lowering with increasing Pr(6)O(11) content were associated to reduction in the barrier height caused by variation in O vacancies at grain boundary.
对低压电子设备的高要求增加了对氧化锌(ZnO)压敏电阻的需求,这种压敏电阻需要具备快速响应、高度非线性的电流-电压特性以及在低击穿电压下的能量吸收能力。然而,击穿电压与晶粒尺寸之间的权衡是低压压敏电阻生产中的一个关键瓶颈。本研究重点介绍了通过采用直接改性柠檬酸盐凝胶涂层技术,制备击穿电压为2.8至13.3 V/mm的氧化镨(Pr(6)O(11))基ZnO压敏电阻陶瓷的合成机制。通过TG/DTG、FTIR、XRD和FESEM分析对前驱体粉末及其陶瓷进行了检测。基于I-V特性测量分析了作为Pr(6)O(11)添加量函数的电学性能。通过将Pr(6)O(11)的量控制在0.2至0.8 mol%,可以在不改变晶粒尺寸的情况下,将每个晶界的击穿电压从0.01调整到0.06 V。非线性系数α在3.0至3.5之间变化,势垒高度在0.56至0.64 eV之间。随着Pr(6)O(11)含量增加,击穿电压和α降低与晶界处氧空位变化导致的势垒高度降低有关。