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氟化杂环聚(萘酰亚胺)薄膜的 KrF 脉冲激光烧蚀。

KrF pulsed laser ablation of thin films made from fluorinated heterocyclic poly(naphthyl-imide)s.

机构信息

Petru Poni Institute of Macromolecular Chemistry, Romanian Academy, Aleea Grigore Ghica Voda 41A, Iasi 700487, Romania.

出版信息

Microsc Microanal. 2012 Jun;18(3):545-57. doi: 10.1017/S1431927612000165.

Abstract

Among the many aspects of laser ablation, development of conical structures induced by excimer laser radiation on polyimide surfaces has been thoroughly investigated. Because the mechanisms that produce these surface textures are not fully understood, two theories, photochemical bond breaking and thermal reaction, have been introduced. Here we present the first study of ultraviolet laser ablation behavior of thin films made from fluorinated poly(naphthyl-imide)s containing oxadiazole rings and the investigation of the mechanism of cone-like structure formation at two laser fluences, 57 and 240 mJ/cm(2). The morphology of thin films before and after laser ablation was studied by using various spectroscopy techniques such as Fourier transform infrared spectroscopy, time-resolved emission and X-ray photoelectron spectroscopy, atomic force microscopy, and contact angle measurements. All of the data suggest impurities shielded at low fluence radiation (57 mJ/cm(2)) and a radiation hardening process at high value fluence (240 mJ/cm(2)), which are proposed as the main mechanisms for laser ablation of our polyimide films, and we bring evidence to support them.

摘要

在激光烧蚀的众多方面中,已经对准分子激光辐射在聚酰亚胺表面上诱导的锥形结构的发展进行了彻底的研究。由于产生这些表面纹理的机制尚未完全了解,因此引入了两种理论,即光化学键断裂和热反应。在这里,我们首次研究了含恶二唑环的氟化聚(萘基-酰亚胺)的紫外激光烧蚀行为,并在两种激光能密度(57 和 240 mJ/cm²)下研究了锥形结构形成的机理。通过使用各种光谱技术,例如傅里叶变换红外光谱,时间分辨发射和 X 射线光电子能谱,原子力显微镜和接触角测量,研究了薄膜在激光烧蚀前后的形态。所有数据均表明,杂质在低能密度辐射(57 mJ/cm²)下被屏蔽,并且在高能密度辐射(240 mJ/cm²)下发生辐射硬化过程,这被认为是我们的聚酰亚胺薄膜激光烧蚀的主要机制,并且我们提供了支持它们的证据。

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