Nanochemistry Research Institute, Curtin University, GPO Box U1987, Perth, WA 6845, Australia.
J Phys Condens Matter. 2012 Jun 27;24(25):255801. doi: 10.1088/0953-8984/24/25/255801. Epub 2012 May 28.
We investigate gallium and nitrogen vacancies in gallium nitride (GaN) bulk and nanowires using self-interaction corrected pseudopotentials (SIC). In particular, we examine the band structures to compare and contrast differences between the SIC results and standard density functional theory (DFT) results using a generalized gradient approximation (GGA) (Perdew et al 1996 Phys. Rev. Lett. 77 3865) functional. For pure nanowires, we observed similar trends in the bandgap behaviour, with the gap decreasing for increasing nanowire diameters (with larger bandgaps using SIC pseudopotentials). For gallium vacancies in bulk GaN and GaN nanowires, SIC results are similar to DFT-GGA results, albeit with larger bandgaps. Nitrogen vacancies in bulk GaN show similar defect-induced states near the conduction band, whilst a lower lying defect state is observed below the valence band for the DFT-GGA calculations and above the valence band for the SIC results. For nitrogen vacancies in GaN nanowires, similar defect states are observed near the conduction band, however, while the SIC calculations also show a defect state/s above the valence band, we were unable to locate this state for the DFT-GGA calculations (possibly because it is hybridized with edge states and buried below the valence band).
我们使用自相互作用修正赝势(SIC)研究了氮化镓(GaN)体材料和纳米线中的镓和氮空位。特别地,我们检查了能带结构,以比较和对比 SIC 结果与使用广义梯度近似(GGA)(Perdew 等人,1996 年物理评论快报 77 3865)函数的标准密度泛函理论(DFT)结果之间的差异。对于纯纳米线,我们观察到带隙行为的相似趋势,随着纳米线直径的增加,带隙减小(使用 SIC 赝势时具有更大的带隙)。对于 GaN 体材料和 GaN 纳米线中的 Ga 空位,SIC 结果与 DFT-GGA 结果相似,尽管带隙较大。GaN 体材料中的氮空位在导带附近显示出类似的缺陷诱导态,而 DFT-GGA 计算中观察到价带下方存在较低的缺陷态,而 SIC 结果则在价带上方。对于 GaN 纳米线中的氮空位,在导带附近观察到类似的缺陷态,然而,虽然 SIC 计算也显示了价带上方的缺陷态/ s,但我们无法在 DFT-GGA 计算中定位这个态(可能是因为它与边缘态杂化并埋在价带下方)。