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自旋交叉化合物薄膜和图案化的现状和展望。

Status and perspectives in thin films and patterning of spin crossover compounds.

机构信息

CNR-Istituto per lo Studio dei Materiali Nanostrutturati, Via P. Gobetti 101, 40121 Bologna, Italy.

出版信息

Phys Chem Chem Phys. 2012 Sep 14;14(34):11867-76. doi: 10.1039/c2cp40879a. Epub 2012 Jun 7.

DOI:10.1039/c2cp40879a
PMID:22678094
Abstract

Spin crossover compounds are a class of functional materials able to switch their spin state upon external stimuli. They were proposed as potential candidates for several technological applications that require highly controlled thin films and patterns. Here we present a critical overview of the most important approaches for thin film growth and patterning of spin-crossover compounds, giving special attention to Fe(II) based molecules, which are the most studied materials. We present both conventional approaches to thin film growth (Langmuir-Blodgett, constructive chemical approach, spin coating, drop casting and vacuum sublimation) and patterning (combined top-down/bottom-up method, soft and unconventional lithography). We critically discuss the application of thin film growth and fabrication techniques highlighting the most critical aspects and the perspectives opened by the recent progress.

摘要

自旋交叉化合物是一类能够在外场刺激下切换自旋态的功能材料。它们被认为是具有潜在应用价值的候选材料,可用于需要高度可控的薄膜和图案的多种技术应用中。本文对自旋交叉化合物的薄膜生长和图案化的最重要方法进行了综述,特别关注了研究最多的基于 Fe(II)的分子。我们介绍了薄膜生长的常规方法(Langmuir-Blodgett、构建化学方法、旋涂法、滴铸法和真空升华法)和图案化方法(自上而下/自下而上的组合方法、软光刻和非常规光刻)。我们批判性地讨论了薄膜生长和制造技术的应用,强调了最关键的方面和最近进展所开辟的前景。

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