College of Environmental Science and Engineering, Tongji University, Shanghai 200092, China.
Water Res. 2012 Sep 1;46(13):4031-6. doi: 10.1016/j.watres.2012.05.005. Epub 2012 May 17.
Occurrence and degree of photoreactivation after ultraviolet (UV) exposure have been widely studied. However, the characteristics of photoreactivated microorganisms were rarely investigated. Hence, in this study, Escherichia coli with plasmids of ampicillin (amp)-resistance or fluorescence was used as indicators to examine the UV inactivation efficiencies and variations of characteristics of E. coli after subsequent photoreactivation. The experimental results indicate that the amp-resistant bacteria and the fluorescent bacteria used in this study had similar trends of UV dose-response curves. 3.5-log(10) and 3-log(10) reductions were achieved with a UV dose of 5 mJ/cm(2) for the amp-resistant and fluorescent E. coli, respectively. There was no significant difference in the UV inactivation behavior, as compared with common strains of E. coli. For the amp-resistant E. coli and the fluorescent E. coli, after exposures with UV doses of 5, 15, 25, 40 and 80 mJ/cm(2), the corresponding percent photoreactivations after a 4 h exposure to photoreactivating light were 1% and 46% respectively for a UV dose of 5 mJ/cm(2), and essentially negligible for all other UV doses. Furthermore, the photoreactivated amp-resistant bacteria still have the ability of amp-resistance. And the revived fluorescent E. coli showed similar fluorescent behavior, compared with the untreated bacteria. The experimental results imply that after UV inactivation and subsequent photoreactivation, the bacteria retained the initial characteristics coded in the plasmid. This reveals a possibility that some characteristics of bacteria can retain or recover through photoreactivation, and a safety concern about pathogenicity revival might need to be considered with UV disinfection and photoreactivation.
紫外线(UV)照射后光复活的发生和程度已经得到了广泛的研究。然而,微生物光复活特性的研究却很少。因此,在本研究中,使用氨苄青霉素(amp)抗性或荧光的大肠杆菌质粒作为指示物,研究了大肠杆菌在随后的光复活后,其 UV 失活动力学和特性变化的特征。实验结果表明,本研究中使用的 amp 抗性菌和荧光菌具有相似的 UV 剂量-反应曲线趋势。对于 amp 抗性和荧光大肠杆菌,分别用 5 mJ/cm2 的 UV 剂量可实现 3.5-log(10)和 3-log(10)的减少。与普通大肠杆菌菌株相比,UV 失活动力学没有明显差异。对于 amp 抗性大肠杆菌和荧光大肠杆菌,在暴露于 5、15、25、40 和 80 mJ/cm2 的 UV 剂量后,在 4 h 的光复活光暴露后,对于 5 mJ/cm2 的 UV 剂量,相应的光复活百分比分别为 1%和 46%,而对于所有其他 UV 剂量则基本可以忽略不计。此外,光复活的 amp 抗性菌仍具有 amp 抗性能力。与未经处理的细菌相比,复活的荧光大肠杆菌表现出相似的荧光行为。实验结果表明,在 UV 失活和随后的光复活后,细菌保留了质粒中编码的初始特性。这表明,细菌的某些特性可能通过光复活保留或恢复,因此在 UV 消毒和光复活后,可能需要考虑有关致病性恢复的安全性问题。