Department of Electrical and Computer Engineering, and Waterloo Institute of Nanotechnology, University of Waterloo, 200 University Avenue West, Waterloo, ON, N2L 3G1, Canada.
Nanotechnology. 2012 Jul 11;23(27):275706. doi: 10.1088/0957-4484/23/27/275706. Epub 2012 Jun 19.
Vertical ordered silicon nanowire arrays with diameters ranging from 30 to 60 nm are fabricated and display enhanced Raman scattering. The first-order 520 cm(-1) phonon mode shows no significant shift or peak broadening with increasing laser power, suggesting that the excellent defect-free diamond crystalline structure and thermal properties of bulk silicon are maintained. The Raman enhancement per unit volume of the first-order phonon peak increases with increasing nanowire diameter, and has maximum enhancement factors of 7.1 and 70 when compared to the original silicon on insulator (SOI) and bulk silicon wafers, respectively. For the array with 60 nm diameter nanowires, the total Raman intensity is larger than that of the SOI wafer. The results are understood using a model based on the confinement of light and are supported by finite difference time domain (FDTD) simulations.
垂直有序的硅纳米线阵列,直径在 30 到 60nm 之间,表现出增强的拉曼散射。一阶 520cm(-1)声子模式随着激光功率的增加没有明显的移动或峰宽变宽,这表明块状硅的优异无缺陷金刚石晶体结构和热性能得以保持。一阶声子峰的单位体积拉曼增强随着纳米线直径的增加而增加,与原始的绝缘体上硅(SOI)和块状硅片相比,分别具有 7.1 和 70 的最大增强因子。对于直径为 60nm 的纳米线阵列,总拉曼强度大于 SOI 晶片。这些结果是基于光的限制模型来理解的,并得到了有限差分时域(FDTD)模拟的支持。