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量子限制纳米线作为增强电导的载体。

Quantum-confined nanowires as vehicles for enhanced electrical transport.

机构信息

Sciencotech, 780 Girard Street NW, Washington, DC 20001, USA.

出版信息

Nanotechnology. 2012 Jul 20;23(28):285707. doi: 10.1088/0957-4484/23/28/285707. Epub 2012 Jun 25.

Abstract

Electrical transport in semiconductor nanowires taking quantum confinement and dielectric confinement into account has been studied. A distinctly new route has been employed for the study. The fundamental science underlying the model is based on a relationship between the quantum confinement and the structural disorder of the nanowire surface. The role of surface energy and thermodynamic imbalance in nanowire structural disorder has been described. A model for the diameter dependence of energy bandgap of nanowires has been developed. Ionized impurity scattering, dislocation scattering and acoustic phonon scattering have been taken into account to study carrier mobility. A series of calculations on silicon nanowires show that carrier mobility in nanowires can be greatly enhanced by quantum confinement and dielectric confinement. The electron mobility can, for example, be a factor of 2-10 higher at room temperature than the mobility in a free-standing silicon nanowire. The calculated results agree well with almost all experimental and theoretical results available in the literature. They successfully explain experimental observations not understood before. The model is general and applicable to nanowires from all possible semiconductors. It is perhaps the first physical model highlighting the impact of both quantum confinement and dielectric confinement on carrier transport. It underscores the basic causes of thin, lowly doped nanowires in the temperature range 200 K ≤ T ≤ 500 K yielding very high carrier mobility. It suggests that the scattering by dislocations (stacking faults) can be very detrimental for carrier mobility.

摘要

考虑到量子限制和介电限制,研究了半导体纳米线中的电子输运。采用了一种全新的研究方法。该模型的基础科学基于纳米线表面的量子限制与结构无序之间的关系。描述了表面能和热力学不平衡在纳米线结构无序中的作用。提出了一种纳米线能带隙直径依赖性的模型。考虑了电离杂质散射、位错散射和声子散射来研究载流子迁移率。对硅纳米线的一系列计算表明,量子限制和介电限制可以大大提高纳米线中的载流子迁移率。例如,在室温下,纳米线中的电子迁移率可比自由-standing 硅纳米线中的迁移率高 2-10 倍。计算结果与文献中几乎所有可用的实验和理论结果都非常吻合。它们成功地解释了以前无法理解的实验观察结果。该模型具有普遍性,适用于所有可能的半导体纳米线。它可能是第一个强调量子限制和介电限制对载流子输运影响的物理模型。它强调了在 200 K ≤ T ≤ 500 K 的温度范围内,薄的、低掺杂的纳米线产生非常高的载流子迁移率的基本原因。它表明位错(堆垛层错)散射对位错迁移率非常有害。

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