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紫外激光诱导熔融石英基底及其溶胶-凝胶涂层的损伤。

Ultraviolet laser-induced damage on fused silica substrate and its sol-gel coating.

机构信息

Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology, Tongji University, Shanghai 200092, China.

出版信息

Opt Lett. 2012 Jun 15;37(12):2364-6. doi: 10.1364/OL.37.002364.

Abstract

A comparative study of the laser-induced damage thresholds (LIDTs) of fused silica substrates and their sol-gel silica coatings was carried out with 355 nm laser irradiation. Chemical etching and superpolishing were employed in different ways to improve the substrate. The laser damage tests showed that the coated substrate was no more susceptible to laser damage than the bare substrate, showing that the substrate quality was the dominant factor limiting the LIDT for UV irradiation. In addition, it was found that high value of substrate microroughness was more harmful to the LIDT of the coated than the bare substrate, and that a proper combination of etching and superpolishing can optimize the LIDT.

摘要

采用 355nm 激光辐照,对熔融石英基底及其溶胶-凝胶二氧化硅涂层的激光诱导损伤阈值(LIDT)进行了对比研究。采用化学腐蚀和超抛光的不同方法对基底进行了改善。激光损伤测试表明,与未镀膜基底相比,镀膜基底不易受到激光损伤,表明基底质量是限制紫外辐照下 LIDT 的主要因素。此外,还发现基底微观粗糙度值较高对镀膜基底的 LIDT 更为不利,适当结合腐蚀和超抛光可以优化 LIDT。

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