Center of Smart Interfaces and Institute for Materials Science, Technische Universität Darmstadt, Petersenstrasse 32, 64287 Darmstadt, Germany.
Chemphyschem. 2012 Aug 27;13(12):3053-60. doi: 10.1002/cphc.201200432. Epub 2012 Aug 14.
GaP, with its large band gap of 2.26 eV (indirect) and 2.78 eV (direct), is a very promising candidate for direct photoelectrochemical water splitting. Herein, p-GaP(100) is investigated as a photocathode for hydrogen generation. The samples are characterized after each preparation step regarding how their photoelectrochemical behavior is influenced by surface composition and structure using a combination of electrochemical and surface-science preparation and characterization techniques. The formation of an Ohmic back contact employing an annealed gold layer and the removal of the native oxides using various etchants are studied. It turns out that the latter has a pronounced effect on the surface composition and structure and therefore also on the electronic properties of the interface. The formation of a thin Ga(2)O(3) buffer layer on the p-GaP(100) surface does not lead to a clear improvement in the photoelectrochemical efficiency, neither do Pt nanocatalyst particles deposited on top of the buffer layer. This behavior can be understood by the electronic structure of these layers, which is not well suited for an efficient charge transfer from the absorber to the electrolyte. First experiments show that the efficiency can be considerably improved by employing a thin GaN layer as a buffer layer on top of the p-GaP(100) surface.
GaP 的带隙为 2.26 eV(间接)和 2.78 eV(直接),非常适合直接光电化学水分解。本文研究了 p-GaP(100) 作为光解水产氢的光阴极。通过电化学和表面科学的制备和表征技术的组合,在每个制备步骤之后对样品进行了表征,以研究表面组成和结构如何影响其光电化学行为。研究了采用退火金层形成欧姆背接触以及使用各种蚀刻剂去除本征氧化物的情况。结果表明,后者对表面组成和结构,以及界面的电子性质有明显的影响。在 p-GaP(100)表面形成薄的 Ga(2)O(3)缓冲层并没有导致光电化学效率的明显提高,在缓冲层上沉积的 Pt 纳米催化剂颗粒也是如此。这种行为可以通过这些层的电子结构来理解,它们不适合有效地将电荷从吸收体转移到电解质中。初步实验表明,通过在 p-GaP(100)表面上使用薄的 GaN 层作为缓冲层,可以显著提高效率。