Department of Chemistry, Tsinghua University, Beijing 100084, People's Republic of China.
Inorg Chem. 2012 Sep 3;51(17):9539-43. doi: 10.1021/ic301371q. Epub 2012 Aug 16.
Silica-based surfactant/inorganic composite mesophases have been extremely studied. In this work, we developed a mild method to realize the room-temperature disassembly of a SiO(2)/cetyltrimethylammonium bromide (CTAB) mesophase in a neutral medium. Using KMnO(4) as a typical etching agent, SiO(2)/CTAB mesophase spheres were partially disassembled into normal or rattle-type hollow structures. The disassembly of the SiO(2)/CTAB spheres was supposed to be driven by anion exchange between permanganate and silicate ions. This unique method makes possible the selective etching of a SiO(2)/CTAB mesophase over a SiO(2) phase.
基于硅的表面活性剂/无机复合介孔材料已经得到了深入的研究。在这项工作中，我们开发了一种温和的方法，实现在中性介质中室温下分解二氧化硅/十六烷基三甲基溴化铵（CTAB）介孔材料。使用高锰酸钾（KMnO4）作为典型的蚀刻剂，将二氧化硅/CTAB 介孔球部分分解成正常或摇瓶型的中空结构。二氧化硅/CTAB 球的分解被认为是由高锰酸根离子和硅酸盐离子之间的阴离子交换驱动的。这种独特的方法使得选择性蚀刻二氧化硅/CTAB 介孔材料相对于二氧化硅相成为可能。
