Santos J A, Ranjbar Samaneh, Neto V F, Ruch D, Grácio J
Department of Mechanical Engineering, Centre for Mechanical Technology and Automation, University of Aveiro, Campus Universitário de Santiago, 3810-193 Aveiro, Portugal.
J Nanosci Nanotechnol. 2012 Aug;12(8):6822-7. doi: 10.1166/jnn.2012.4555.
Although large focus has been placed into the deposition of nanocrystalline and ultra-nanocrystalline diamond films, most of this research uses microwave plasma assisted CVD systems. However, the growth conditions used in microwave systems cannot be directly used in hot-filament CVD systems. This paper, aims to enlarge the knowledge of the diamond film depositing process. H2/CH4/Ar gas mixtures have been used to deposit micro, nano and ultra-nanocrystalline diamond films by hot-filament CVD systems. Additionally, the distance between the filaments array and the substrate was varied, in order to observe its effect and consequently the effect of a lower substrate temperature in the nucleation density and deposition. All the samples were characterized for microstructure and quality, using scanning electron microscopy and Raman spectroscopy.
尽管大量研究聚焦于纳米晶和超纳米晶金刚石薄膜的沉积，但大部分此类研究都采用微波等离子体辅助化学气相沉积系统。然而，微波系统中使用的生长条件无法直接应用于热丝化学气相沉积系统。本文旨在拓展对金刚石薄膜沉积过程的认识。已使用H₂/CH₄/Ar气体混合物通过热丝化学气相沉积系统沉积微米、纳米和超纳米晶金刚石薄膜。此外，改变了丝状阵列与衬底之间的距离，以观察其影响，进而观察较低衬底温度对成核密度和沉积的影响。使用扫描电子显微镜和拉曼光谱对所有样品的微观结构和质量进行了表征。
