Santos J A, Neto V F, Cabral G, Ruch D, Grácio J
Department of Mechanical Engineering, Centre for Mechanical Technology and Automation, University of Aveiro, 3810-193 Aveiro, Portugal.
J Nanosci Nanotechnol. 2011 Jun;11(6):5388-93. doi: 10.1166/jnn.2011.3785.
Tungsten carbide alloys possess a large number of applications, due to its high hardness, high resistance to heat and to wear, which makes it ideal to be used in wear parts of machinery or on surfaces liable to corrosion, abrasion or high temperatures. For practical applications, it is alloyed with cobalt (Co) or nickel (Ni) in order to improve its properties. The increasing demand of broadening the operation limits of some components, impose the need to improve its life time. Coating these parts with hard and smooth diamond thin film may improve the wear performance and decrease their roughness and friction coefficient. In this work, a comparative study of nanodiamond films deposit onto WC-Co and WC-Ni, by means of a hot-filament Chemical Vapour Deposition (HFCVD) system, is presented. The study was accomplished by varying the CH4/H2/Ar gas ratio of the deposition process. The substrate temperature was kept low (< 700 degrees C) to minimize the thermal stress in the coating-substrate system. The microstructure of the deposited diamond film was characterized using Scanning Electron Microscopy (SEM), Raman spectroscopy and X-ray diffraction spectroscopy. Roughness of the working surfaces were also accessed prior and after the depositions.
碳化钨合金因其高硬度、高耐热性和耐磨性而有大量应用，这使其非常适合用于机械的耐磨部件或易受腐蚀、磨损或高温影响的表面。在实际应用中，它与钴（Co）或镍（Ni）合金化以改善其性能。对拓宽某些部件运行极限的需求不断增加，这就需要提高其使用寿命。用坚硬且光滑的金刚石薄膜涂覆这些部件可以改善其耐磨性能并降低其粗糙度和摩擦系数。在这项工作中，展示了通过热丝化学气相沉积（HFCVD）系统在WC-Co和WC-Ni上沉积纳米金刚石薄膜的对比研究。该研究通过改变沉积过程中的CH4/H2/Ar气体比例来完成。保持较低的基板温度（<700摄氏度）以最小化涂层-基板系统中的热应力。使用扫描电子显微镜（SEM）、拉曼光谱和X射线衍射光谱对沉积的金刚石薄膜的微观结构进行了表征。还在沉积前后对工作表面的粗糙度进行了测定。
