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Fe8Al(17.4)Si(7.6)中萤石型的碎裂:18 电子规则决定的金属间化合物的结构复杂性。

Fragmentation of the fluorite type in Fe8Al(17.4)Si(7.6): structural complexity in intermetallics dictated by the 18 electron rule.

机构信息

Department of Chemistry, University of Wisconsin-Madison, 1101 University Avenue, Madison, Wisconsin 53706, USA.

出版信息

Inorg Chem. 2012 Oct 1;51(19):10341-9. doi: 10.1021/ic3015089. Epub 2012 Sep 17.

DOI:10.1021/ic3015089
PMID:22984870
Abstract

This Article presents the synthesis, structure determination, and bonding analysis of Fe(8)Al(17.4)Si(7.6). Fe(8)Al(17.4)Si(7.6) crystallizes in a new monoclinic structure type based on columns of the fluorite (CaF(2)) structure type. As such, the compound can be seen as part of a structural series in which the fluorite structure-adopted by several transition metal disilicides (TMSi(2))-is fragmented by the incorporation of Al. Electronic structure analysis using density functional theory (DFT) and DFT-calibrated Hückel calculations indicates that the fluorite-type TMSi(2) phases (TM = Co, Ni) exhibit density of states (DOS) pseudogaps near their Fermi energies. An analogous pseudogap occurs for Fe(8)Al(17.4)Si(7.6), revealing that its complex structure serves to preserve this stabilizing feature of the electronic structure. Pursuing the origins of these pseudogaps leads to a simple picture: the DOS minimum in the TMSi(2) structures arises via a bonding scheme analogous to those of 18 electron transition metal complexes. Replacement of Si with Al leads to the necessity of increasing the (Si/Al):TM ratio to maintain this valence electron concentration. The excess Si/Al atoms are accommodated through the fragmentation of the fluorite type. The resulting picture highlights how the elucidating power of bonding concepts from transition metal complexes can extend into the intermetallic realm.

摘要

本文介绍了 Fe(8)Al(17.4)Si(7.6)的合成、结构确定和键合分析。Fe(8)Al(17.4)Si(7.6)结晶为一种新的单斜结构类型,基于萤石(CaF(2))结构类型的柱。因此,该化合物可以被视为结构系列的一部分,其中萤石结构被几个过渡金属二硅化物(TMSi(2))采用,并通过掺入 Al 而被破坏。使用密度泛函理论(DFT)和 DFT 校准的休克尔计算进行电子结构分析表明,萤石型 TMSi(2)相(TM = Co,Ni)在其费米能级附近表现出态密度(DOS)赝隙。Fe(8)Al(17.4)Si(7.6)也存在类似的赝隙,表明其复杂的结构有助于保持电子结构的这种稳定特征。研究这些赝隙的起源导致了一个简单的图景:TMSi(2)结构中的 DOS 最小值是通过类似于 18 电子过渡金属配合物的键合方案产生的。用 Al 取代 Si 会导致需要增加(Si/Al):TM 比以保持这种价电子浓度。多余的 Si/Al 原子通过萤石型的破碎得到容纳。由此产生的图景突出了过渡金属配合物的键合概念的阐明力如何扩展到金属间化合物领域。

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