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硅纳米线热导率降低的微观起源。

Microscopic origin of the reduced thermal conductivity of silicon nanowires.

机构信息

Department of Chemistry, University of California, Davis, California 95616, USA.

出版信息

Phys Rev Lett. 2012 May 25;108(21):215901. doi: 10.1103/PhysRevLett.108.215901. Epub 2012 May 21.

Abstract

We designed nanowires with a tailored surface structure and composition and with specific core defects to investigate the microscopic origin of the reduced thermal conductivity of Si at the nanoscale. We considered a diameter (15 nm) comparable to that of systems fabricated in recent experiments and we computed the thermal conductivity using equilibrium molecular dynamics simulations. We found that the presence of a native oxide surface layer may account for a tenfold to ~30-fold decrease in conductivity, with respect to bulk Si, depending on the level of roughness. However it is only the combination of core defects and surface ripples that enables a decrease close to 2 orders of magnitude, similar to that reported experimentally.

摘要

我们设计了具有定制表面结构和组成以及特定核心缺陷的纳米线,以研究纳米尺度下 Si 的热导率降低的微观起源。我们考虑了与最近实验中制造的系统相当的直径(15nm),并使用平衡分子动力学模拟计算了热导率。我们发现,天然氧化物表面层的存在可能导致与体 Si 相比,电导率降低 10 倍至~30 倍,具体取决于粗糙度水平。然而,只有核心缺陷和表面波纹的组合才能使电导率降低接近 2 个数量级,这与实验报道的结果相似。

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