Physique de la Matière Condensée, Ecole Polytechnique, CNRS, 91128 Palaiseau, France.
Phys Rev Lett. 2012 Jun 22;108(25):256801. doi: 10.1103/PhysRevLett.108.256801. Epub 2012 Jun 18.
The room-temperature longitudinal piezoresistance of n-type and p-type crystalline silicon along selected crystal axes is investigated under uniaxial compressive stresses up to 3 GPa. While the conductance (G) of n-type silicon eventually saturates at ≈ 45% of its zero-stress value (G(0)) in accordance with the charge transfer model, in p-type material G/G(0) increases above a predicted limit of ≈ 4.5 without any significant saturation, even at 3 GPa. Calculation of G/G(0) using ab initio density functional theory reveals that neither G nor the mobility, when properly averaged over the hole distribution, saturate at stresses lower than 3 GPa. The lack of saturation has important consequences for strained-silicon technologies.
在高达 3GPa 的单向压缩应力下,研究了沿选定晶轴的 n 型和 p 型晶体硅的室温纵向压阻。虽然 n 型硅的电导(G)最终按照电荷转移模型在大约 45%的零应力值(G(0))处饱和,但在 p 型材料中,G/G(0)在没有明显饱和的情况下超过了约 4.5 的预测极限,即使在 3GPa 下也是如此。使用从头算密度泛函理论计算 G/G(0)表明,在低于 3GPa 的应力下,G 和迁移率(当适当地在空穴分布上平均时)都不会饱和。这种没有饱和的情况对应变硅技术有重要影响。