Technische Universität Darmstadt, Eduard-Zintl-Institut, Fachbereich Chemie, Fachgebiet Anorganische Chemie, Petersenstrasse 18, 64287 Darmstadt, Germany.
Chemistry. 2012 Nov 19;18(47):14996-5003. doi: 10.1002/chem.201201880. Epub 2012 Oct 2.
Low-layered, transparent graphene is accessible by a chemical vapor deposition (CVD) technique on a Ni-catalyst layer, which is deposited on a <100> silicon substrate. The number of graphene layers on the substrate is controlled by the grain boundaries in the Ni-catalyst layer and can be studied by micro Raman analysis. Electrical studies showed a sheet resistance (R(sheet)) of approximately 1435 Ω per □, a contact resistance (R(c)) of about 127 Ω, and a specific contact resistance (R(sc)) of approximately 2.8×10(-4) Ω cm(2) for the CVD graphene samples. Transistor output characteristics for the graphene sample demonstrated linear current/voltage behavior. A current versus voltage (I(ds)-V(ds)) plot clearly indicates a p-conducting characteristic of the synthesized graphene. Gas-sensor measurements revealed a high sensor activity of the low-layer graphene material towards H(2) and CO. At 300 °C, a sensor response of approximately 29 towards low H(2) concentrations (1 vol %) was observed, which is by a factor of four higher than recently reported.
在<100>硅衬底上沉积镍催化剂层,通过化学气相沉积(CVD)技术可获得低层数、透明的石墨烯。衬底上的石墨烯层数由镍催化剂层中的晶界控制,并可通过微拉曼分析进行研究。电性能研究表明,CVD 石墨烯样品的方阻(R(sheet))约为 1435 Ω/□,接触电阻(R(c))约为 127 Ω,比接触电阻(R(sc))约为 2.8×10(-4) Ω·cm(2)。石墨烯样品的晶体管输出特性表现出线性电流/电压行为。电流与电压(I(ds)-V(ds))曲线清楚地表明了合成石墨烯的 p 型导电特性。气体传感器测量表明,低层数石墨烯材料对 H(2)和 CO 具有高的传感器活性。在 300°C 下,观察到低 H(2)浓度(1 体积%)下约 29 的传感器响应,比最近报道的高出约四倍。