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散射测量中线边缘粗糙度的解析建模与三维有限元模拟

Analytical modeling and three-dimensional finite element simulation of line edge roughness in scatterometry.

作者信息

Kato Akiko, Burger Sven, Scholze Frank

机构信息

Hochschule Ruhr West-University of Applied Sciences, Mülheim an der Ruhr, Germany. akiko.kato@hs‐ruhrwest.de

出版信息

Appl Opt. 2012 Sep 20;51(27):6457-64. doi: 10.1364/AO.51.006457.

Abstract

The influence of edge roughness in angle-resolved scatterometry at periodically structured surfaces is investigated. A good description of the radiation interaction with structured surfaces is crucial for the understanding of optical imaging processes such as, e.g., in photolithography. We compared an analytical two-dimensional (2D) model and a numerical three-dimensional simulation with respect to the characterization of 2D diffraction of a line grating involving structure roughness. The results show a remarkably high agreement. The diffraction intensities of a rough structure can therefore be estimated using the numerical simulation result of an undisturbed structure and an analytically derived correction function. This work allows to improve scatterometric results for the case of practically relevant 2D structures.

摘要

研究了周期性结构表面的角度分辨散射测量中边缘粗糙度的影响。对辐射与结构化表面相互作用的良好描述对于理解诸如光刻等光学成像过程至关重要。我们在涉及结构粗糙度的线光栅二维衍射表征方面,比较了一个解析二维模型和一个数值三维模拟。结果显示出非常高的一致性。因此,可以使用未受干扰结构的数值模拟结果和解析推导的校正函数来估计粗糙结构的衍射强度。这项工作有助于改善实际相关二维结构情况下的散射测量结果。

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