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溶剂化和吸附链接剂的持久性对通过链接剂辅助组装将 CdSe 量子点附着到 TiO2 上的影响。

Influence of solvation and the persistence of adsorbed linkers on the attachment of CdSe quantum dots to TiO2 via linker-assisted assembly.

机构信息

Department of Chemistry, University at Buffalo, The State University of New York, 14260-3000, United States.

出版信息

Langmuir. 2012 Nov 6;28(44):15598-605. doi: 10.1021/la303504u. Epub 2012 Oct 22.

DOI:10.1021/la303504u
PMID:23062069
Abstract

CdSe quantum dots (QDs) were attached to the surfaces of nanocrystalline TiO(2) films functionalized with 16-mercaptohexadecanoic acid (MHDA). The solvent from which MHDA was adsorbed to TiO(2) determined the amount of adsorbed MHDA, the extent of ordering within monolayers, and the lability of MHDA-TiO(2) interactions, which in turn dictated the quality of QD-functionalized TiO(2) films. When MHDA was adsorbed to TiO(2) from dichloromethane, toluene, or heptane, it desorbed into toluene dispersions of CdSe QDs, causing the flocculation of QDs and the formation of opaque, nonuniform QD-functionalized TiO(2) films overcoated with thick (0.1-0.5 μm) layers of agglomerated CdSe. When MHDA was adsorbed to TiO(2) from tetrahydrofuran, it persisted upon exposure to toluene dispersions of QDs. The resulting QD-functionalized TiO(2) films were transparent with a uniform loading of QDs and without an agglomerated overlayer. Control experiments revealed that flocculation and the formation of low-quality films were correlated with the presence of MHDA in dispersions of QDs; we propose that MHDA adsorbed to CdSe QDs and decreased their dispersibility in nonpolar solvents. The susceptibility of QDs to MHDA-induced flocculation and agglomeration increased with postsynthesis purification. Our results highlight the influence of solvation on the persistence of linker-substrate interactions, which is of central importance in optimizing the linker-assisted assembly of interfaces.

摘要

硒化镉量子点 (QDs) 被附着在经 16-巯基十六烷酸 (MHDA) 功能化的纳米晶二氧化钛 (TiO 2 ) 薄膜的表面上。从 TiO 2 上吸附 MHDA 的溶剂决定了吸附的 MHDA 的量、单层内的有序程度以及 MHDA-TiO 2 相互作用的不稳定性,而这又决定了 QD 功能化 TiO 2 薄膜的质量。当 MHDA 从二氯甲烷、甲苯或庚烷吸附到 TiO 2 上时,它会解吸到 CdSe QD 的甲苯分散体中,导致 QD 絮凝和不透明、不均匀的 QD 功能化 TiO 2 薄膜的形成,这些薄膜上面覆盖着厚(0.1-0.5 μm)的聚集体 CdSe 层。当 MHDA 从四氢呋喃吸附到 TiO 2 上时,它在暴露于 QD 的甲苯分散体中仍然存在。所得的 QD 功能化 TiO 2 薄膜是透明的,具有均匀的 QD 负载且没有聚集体的覆盖层。对照实验表明,絮凝和低质量薄膜的形成与 MHDA 在 QD 的分散体中的存在有关;我们提出,吸附到 CdSe QD 上的 MHDA 降低了它们在非极性溶剂中的分散性。QD 对 MHDA 诱导的絮凝和聚集的敏感性随着后合成的纯化而增加。我们的结果突出了溶剂化对连接体-底物相互作用稳定性的影响,这对于优化连接体辅助界面组装具有重要意义。

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