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氧化锆棒增强IPS Empress II全瓷桥的有限元分析

Finite Element Analysis of IPS Empress II Ceramic Bridge Reinforced by Zirconia Bar.

作者信息

Kermanshah H, Bitaraf T, Geramy A

机构信息

Assistant Professor, Department of Dental Research Center and Operative Dentistry, Faculty of Dentistry, Tehran University of Medical Science, Iran.

出版信息

J Dent (Tehran). 2012 Fall;9(4):196-203. Epub 2012 Dec 31.

Abstract

OBJECTIVE

The aim of this study was to determine the effect of trenched zirconia bar on the von Mises stress distribution of IPS -Empress II core ceramics.

MATERIALS AND METHODS

The three-dimensional model including a three-unit bridge from the second premolar to the second molar was designed. The model was reinforced with zirconia bar (ZB), zirconia bar with vertical trench (VZB) and zirconia bar with horizontal trench (HZB) (cross sections of these bars were circular). The model without zirconia bar was designed as the control. The bridges were loaded by 200 N and 500 N on the occlusal surface at the middle of the pontic component and von Mises stresses were evaluated along a defined path.

RESULTS

IN THE CONNECTOR AREA, VON MISES STRESS IN MPA WERE APPROXIMATELY IDENTICAL IN THE SPECIMENS WITH ZB (AT MOLAR CONNECTOR (MC): 4.75 and at premolar connector (PC): 6.40) and without ZB (MC: 5.50, PC: 6.68), and considerable differences were not recognized. Whereas, Von-Mises stress (MPa) in the specimens with horizontal trenched Zirconia bar (HZB) (MC: 3.91, PC: 2.44) and Vertical trenched Zirconia bar (VZB) (MC: 2.53, PC: 2.56) was decreased considerably.

CONCLUSION

Embeded trenched zirconia bar could reinforce IPS-Empress II at the connector area which is a main failure region in all ceramic fixed partial dentures.

摘要

目的

本研究旨在确定带沟槽氧化锆棒对IPS - Empress II核瓷的冯·米塞斯应力分布的影响。

材料与方法

设计一个包括从第二前磨牙到第二磨牙的三单位桥的三维模型。该模型分别用氧化锆棒(ZB)、垂直沟槽氧化锆棒(VZB)和水平沟槽氧化锆棒(HZB)(这些棒的横截面为圆形)进行增强。未使用氧化锆棒的模型作为对照。在桥体部件中部的咬合面上施加200 N和500 N的载荷,并沿一条定义的路径评估冯·米塞斯应力。

结果

在连接区域,使用ZB的试件(在磨牙连接体(MC)处:4.75,在前磨牙连接体(PC)处:6.40)和未使用ZB的试件(MC:5.50,PC:6.68)的冯·米塞斯应力(MPa)大致相同,未发现显著差异。然而,使用水平沟槽氧化锆棒(HZB)(MC:3.91,PC:2.44)和垂直沟槽氧化锆棒(VZB)(MC:2.53,PC:2.56)的试件中的冯·米塞斯应力(MPa)显著降低。

结论

嵌入的带沟槽氧化锆棒可在连接区域增强IPS - Empress II,连接区域是全瓷固定局部义齿的主要失效区域。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c49c/3536454/7fbe42725bf3/jod-9-196f1.jpg

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