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从头算方法计算体半导体中深能级载流子非辐射复合率。

Ab initio calculations of deep-level carrier nonradiative recombination rates in bulk semiconductors.

机构信息

Materials Sciences Division, Lawrence Berkeley National Laboratory, One Cyclotron Road, Mail Stop 66, Berkeley, California 94720, USA.

出版信息

Phys Rev Lett. 2012 Dec 14;109(24):245501. doi: 10.1103/PhysRevLett.109.245501. Epub 2012 Dec 10.

DOI:10.1103/PhysRevLett.109.245501
PMID:23368341
Abstract

Nonradiative carrier recombination is of both applied and fundamental interest. Here a novel algorithm is introduced to calculate such a deep level nonradiative recombination rate using the ab initio density functional theory. This algorithm can calculate the electron-phonon coupling constants all at once. An approximation is presented to calculate the phonon modes for one impurity in a large supercell. The neutral Zn impurity site together with a N vacancy is considered as the carrier-capturing deep impurity level in bulk GaN. Its capture coefficient is calculated as 5.57 × 10(-10)cm(3)/s at 300 K. We found that there is no apparent onset of such a nonradiative process as a function of temperature.

摘要

非辐射载流子复合具有应用和基础研究的双重兴趣。这里引入了一种新的算法,使用从头算密度泛函理论来计算这种深能级非辐射复合率。该算法可以一次性计算电子-声子耦合常数。提出了一种在大超胞中计算单个杂质声子模式的近似方法。中性 Zn 杂质位与一个 N 空位一起被认为是体 GaN 中的载流子俘获深杂质能级。在 300 K 时,其俘获系数计算值为 5.57×10(-10)cm(3)/s。我们发现,作为温度的函数,这种非辐射过程没有明显的开始。

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