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自动腔内标本包埋用于连续块面电子显微镜。

Automated in-chamber specimen coating for serial block-face electron microscopy.

机构信息

Department of Biomedical Optics, Max Planck Institute for Medical Research, Heidelberg, Germany.

出版信息

J Microsc. 2013 May;250(2):101-110. doi: 10.1111/jmi.12023. Epub 2013 Mar 1.

DOI:10.1111/jmi.12023
PMID:23451833
Abstract

When imaging insulating specimens in a scanning electron microscope, negative charge accumulates locally ('sample charging'). The resulting electric fields distort signal amplitude, focus and image geometry, which can be avoided by coating the specimen with a conductive film prior to introducing it into the microscope chamber. This, however, is incompatible with serial block-face electron microscopy (SBEM), where imaging and surface removal cycles (by diamond knife or focused ion beam) alternate, with the sample remaining in place. Here we show that coating the sample after each cutting cycle with a 1-2 nm metallic film, using an electron beam evaporator that is integrated into the microscope chamber, eliminates charging effects for both backscattered (BSE) and secondary electron (SE) imaging. The reduction in signal-to-noise ratio (SNR) caused by the film is smaller than that caused by the widely used low-vacuum method. Sample surfaces as large as 12 mm across were coated and imaged without charging effects at beam currents as high as 25 nA. The coatings also enabled the use of beam deceleration for non-conducting samples, leading to substantial SNR gains for BSE contrast. We modified and automated the evaporator to enable the acquisition of SBEM stacks, and demonstrated the acquisition of stacks of over 1000 successive cut/coat/image cycles and of stacks using beam deceleration or SE contrast.

摘要

在扫描电子显微镜中对绝缘样品进行成像时,局部会积聚负电荷(“样品充电”)。由此产生的电场会扭曲信号幅度、焦点和图像几何形状,可以通过在将样品引入显微镜腔之前用导电膜对其进行涂层来避免。然而,这与串行块面电子显微镜(SBEM)不兼容,在 SBEM 中,成像和表面去除循环(通过金刚石刀或聚焦离子束)交替进行,而样品保持原位。在这里,我们展示了使用集成在显微镜腔中的电子束蒸发器,在每个切割循环后用 1-2nm 的金属膜对样品进行涂层,可以消除背散射(BSE)和二次电子(SE)成像的充电效应。薄膜引起的信噪比(SNR)降低小于广泛使用的低真空方法引起的 SNR 降低。在高达 25nA 的束流下,对直径达 12mm 的大样品表面进行涂层和成像,而不会产生充电效应。这些涂层还使得可以对非导电样品使用束减速,从而使 BSE 对比度获得显著的 SNR 增益。我们对蒸发器进行了修改和自动化,以实现 SBEM 堆叠的获取,并演示了获取超过 1000 个连续切割/涂层/成像循环的堆叠以及使用束减速或 SE 对比度的堆叠。

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