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电子断层扫描揭示飞秒激光超掺杂硅中的硒分凝

Selenium segregation in femtosecond-laser hyperdoped silicon revealed by electron tomography.

机构信息

CEA, LETI, MINATEC Campus, 17 rue des Martyrs, 38054 Grenoble Cedex 9, France.

出版信息

Microsc Microanal. 2013 Jun;19(3):716-25. doi: 10.1017/S1431927613000342. Epub 2013 Apr 10.

Abstract

Doping of silicon with chalcogens (S, Se, Te) by femtosecond laser irradiation to concentrations well above the solubility limit leads to near-unity optical absorptance in the visible and infrared (IR) range and is a promising route toward silicon-based IR optoelectronics. However, open questions remain about the nature of the IR absorptance and in particular about the impact of the dopant distribution and possible role of dopant diffusion. Here we use electron tomography using a high-angle annular dark-field (HAADF) detector in a scanning transmission electron microscope (STEM) to extract information about the three-dimensional distribution of selenium dopants in silicon and correlate these findings with the optical properties of selenium-doped silicon. We quantify the tomography results to extract information about the size distribution and density of selenium precipitates. Our results show correlation between nanoscale distribution of dopants and the observed sub-band gap optical absorptance and demonstrate the feasibility of HAADF-STEM tomography for the investigation of dopant distribution in highly-doped semiconductors.

摘要

用飞秒激光辐照将硫族元素(S、Se、Te)掺杂到硅中,浓度远高于其溶解度极限,会导致硅在可见光和红外(IR)范围内的光吸收率接近 100%,这是实现基于硅的红外光电子学的有前途的途径。然而,关于 IR 吸收率的性质,特别是关于掺杂剂分布的影响和掺杂剂扩散的可能作用,仍存在一些悬而未决的问题。在这里,我们使用扫描透射电子显微镜(STEM)中的高角度环形暗场(HAADF)探测器进行电子层析成像,以提取硅中硒掺杂剂的三维分布信息,并将这些发现与硒掺杂硅的光学性质相关联。我们对层析成像结果进行量化,以提取硒沉淀物的大小分布和密度信息。我们的结果表明,掺杂剂的纳米尺度分布与观察到的亚带隙光吸收率之间存在相关性,并证明了 HAADF-STEM 层析成像在研究高掺杂半导体中掺杂剂分布的可行性。

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