Chi Ming-Bo, Hao Peng, Wu Yi-Hui
State Key Lab of Applied Optics, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China.
Guang Pu Xue Yu Guang Pu Fen Xi. 2013 Jan;33(1):241-5.
The 2-D slit array mask is a new design of Hadamard spectrometer mask. Having discussed the influence of the inconsistency caused by the machining errors in the size and location between the slits in the same column on the wavelength accuracy of the Hadamard spectrometer, the authors bring up with the way to decrease the influence on the wavelength accuracy of the spectrometer caused by the difference in the height and location vertical to the spectrum between the slits in the same column, and then estimate the spectral shift caused by the relative location shift along the spectrum between the slits in the same column. A model for simulation was built, and the measurement errors in the decoded spectrum generated by one column of the slits on the mask were calculated, when there are inconsistency errors in width and location along the spectrum between the slits in another column. Based on the simulation calculation, we can determine the machining precision of the mask. The research will be meaningful to the design of the 2-D slit array mask using MEMS(micro-electro-mechanism system) technique and the revise of the decoded spectrum, which can provide the spectrometer with a reasonable wavelength accuracy.
二维狭缝阵列掩膜是一种新型的哈达玛光谱仪掩膜。在讨论了同一列狭缝尺寸和位置的加工误差所导致的不一致性对哈达玛光谱仪波长精度的影响之后，作者提出了减小同一列狭缝垂直于光谱方向的高度和位置差异对光谱仪波长精度影响的方法，进而估算了同一列狭缝沿光谱方向的相对位置偏移所引起的光谱位移。建立了模拟模型，并计算了当另一列狭缝沿光谱方向的宽度和位置存在不一致误差时，掩膜上一列狭缝在解码光谱中产生的测量误差。基于模拟计算，我们可以确定掩膜的加工精度。该研究对于采用微机电系统（MEMS）技术的二维狭缝阵列掩膜设计以及解码光谱的修正具有重要意义，可为光谱仪提供合理的波长精度。
