Lehrstuhl für Angewandte Physik, Universität Erlangen-Nürnberg, Germany.
ACS Nano. 2013 May 28;7(5):4441-8. doi: 10.1021/nn401037c. Epub 2013 Apr 23.
We present a fabrication process for freely suspended membranes consisting of bi- and trilayer graphene grown on silicon carbide. The procedure, involving photoelectrochemical etching, enables the simultaneous fabrication of hundreds of arbitrarily shaped membranes with an area up to 500 μm(2) and a yield of around 90%. Micro-Raman and atomic force microscopy measurements confirm that the graphene layer withstands the electrochemical etching and show that the membranes are virtually unstrained. The process delivers membranes with a cleanliness suited for high-resolution transmission electron microscopy (HRTEM) at atomic scale. The membrane, and its frame, is very robust with respect to thermal cycling above 1000 °C as well as harsh acidic or alkaline treatment.
我们提出了一种由碳化硅上生长的双层和三层石墨烯组成的自由悬浮膜的制造工艺。该工艺涉及到光电化学蚀刻，能够同时制造数百个任意形状的膜，面积可达 500μm²，产率约为 90%。微拉曼和原子力显微镜测量证实，石墨烯层能够经受住电化学蚀刻，并表明膜几乎没有应变。该工艺提供的膜具有清洁度，适合原子尺度的高分辨率透射电子显微镜（HRTEM）。该膜及其框架在 1000°C 以上的热循环以及苛刻的酸性或碱性处理中都非常坚固。
