Luo Jianyi, Zeng Qingguang, Long Yongbing, Wang Yi
Institute of Thin Film and Nano Materials, School of Applied Physics and Materials, Wuyi University, Jiangmen, Guangdong 529020, China.
J Nanosci Nanotechnol. 2013 Feb;13(2):1372-6. doi: 10.1166/jnn.2013.6032.
In this paper, nano-polycrystalline WO3 thin films with the thickness in the range of 100-200 nm have been uniformly prepared on the designed regions of ITO (indium tin oxide) glass substrates by thermal evaporation deposition. Their crystal structures, surface morphologies and uniformities are investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM), respectively. The solid-state electrochromic display (ECD) devices based on these nano-polycrystalline WO3 thin films have been also fabricated and have demonstrated to have better performance than normal thin films, including shorter response time, higher contrast, and furthermore, higher stability to keep the colored state without power consumption. These results demonstrate nano-polycrystalline WO3 thin films can be applied to improve the performance of ECD devices, especially suitable to static display.
在本文中，通过热蒸发沉积在氧化铟锡（ITO）玻璃基板的设计区域上均匀制备了厚度在100 - 200纳米范围内的纳米多晶WO₃薄膜。分别利用X射线衍射（XRD）、扫描电子显微镜（SEM）和原子力显微镜（AFM）对其晶体结构、表面形貌和均匀性进行了研究。基于这些纳米多晶WO₃薄膜的固态电致变色显示器（ECD）器件也已制备完成，并且已证明其性能优于普通薄膜，包括更短的响应时间、更高的对比度，此外，在无功耗情况下保持着色状态具有更高的稳定性。这些结果表明纳米多晶WO₃薄膜可用于改善ECD器件的性能，尤其适用于静态显示。
