Department of Materials and Interfaces, Weizmann Institute, Rehovot 76100, Israel.
Chemphyschem. 2013 Jul 22;14(10):2125-31. doi: 10.1002/cphc.201201003. Epub 2013 May 6.
This study describes a new method for fabrication of thin composite films using physical vapor deposition (PVD). Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene-like structure (Ti/IF-WS2) were fabricated with a modified PVD machine. The evaporation process includes the pulsed deposition of IF-WS2 by a sprayer head. This process results in IF-WS2 nanoparticles embedded in a Ti matrix. The layers were characterized by various techniques, which confirm the composition and structure of the hybrid film. The Ti/IF-WS2 shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate. The Ti/IF films show very good antireflective properties in the visible and near-IR region. Such films may find numerous applications, for example, in the aerospace and medical technology.
本研究描述了一种使用物理气相沉积（PVD）制造薄复合膜的新方法。使用改进的 PVD 机，制备了钛（Ti）和含有无机类富勒烯结构的二硫化钨纳米粒子的 Ti 复合薄膜（Ti/IF-WS2）。蒸发过程包括通过喷雾头脉冲沉积 IF-WS2。此过程导致 IF-WS2 纳米颗粒嵌入 Ti 基体中。通过各种技术对层进行了表征，这些技术证实了混合膜的组成和结构。与 Ti 层或 Ti 衬底相比，Ti/IF-WS2 具有更好的耐磨性和更低的摩擦系数。Ti/IF 薄膜在可见光和近红外区域具有非常好的抗反射性能。此类薄膜可能会有许多应用，例如在航空航天和医疗技术领域。
