Advanced Nanotechnology Center, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China.
Phys Chem Chem Phys. 2013 Aug 7;15(29):12132-8. doi: 10.1039/c3cp50694k. Epub 2013 May 14.
A Ni/SiO2 catalyst was prepared by the plasma decomposition of a nickel precursor via dielectric barrier discharge (DBD). The obtained Ni/SiO2 catalyst shows an enhanced H2S resistance for methanation of syngas (CO + H2). The plasma decomposition has a significant influence on the structural property of Ni/SiO2. The plasma decomposed catalyst shows less defect sites on Ni particles. The formation of Ni-sulfur species was effectively inhibited. The mechanism of H2S poisoning on different catalysts with and without plasma decomposition was also discussed according to the reaction temperature.
一种 Ni/SiO2 催化剂是通过介质阻挡放电（DBD）等离子体分解镍前驱体制备的。所得到的 Ni/SiO2 催化剂对于合成气（CO+H2）的甲烷化表现出增强的 H2S 抗性。等离子体分解对 Ni/SiO2 的结构性能有显著影响。等离子体分解催化剂在 Ni 颗粒上显示出较少的缺陷位。Ni-硫物种的形成得到有效抑制。根据反应温度，还讨论了在有和没有等离子体分解的情况下不同催化剂上 H2S 中毒的机理。
