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纳米尺度的应变测量:会聚束电子衍射、纳米束电子衍射、高分辨率成像和暗场电子全息术的比较。

Strain measurement at the nanoscale: Comparison between convergent beam electron diffraction, nano-beam electron diffraction, high resolution imaging and dark field electron holography.

机构信息

CEA-INAC/UJF-Grenoble UMR-E, SP2M, LEMMA, Minatec Grenoble F-38054, France.

出版信息

Ultramicroscopy. 2013 Aug;131:10-23. doi: 10.1016/j.ultramic.2013.03.014. Epub 2013 Apr 6.

Abstract

Convergent beam electron diffraction (CBED), nano-beam electron diffraction (NBED or NBD), high resolution imaging (HRTEM and HRSTEM) and dark field electron holography (DFEH or HoloDark) are five TEM based techniques able to quantitatively measure strain at the nanometer scale. In order to demonstrate the advantages and disadvantages of each technique, two samples composed of epitaxial silicon-germanium layers embedded in a silicon matrix have been investigated. The five techniques are then compared in terms of strain precision and accuracy, spatial resolution, field of view, mapping abilities and ease of performance and analysis.

摘要

会聚束电子衍射 (CBED)、纳米束电子衍射 (NBED 或 NBD)、高分辨率成像 (HRTEM 和 HRSTEM) 和暗场电子全息术 (DFEH 或 HoloDark) 是五种基于 TEM 的技术,能够在纳米尺度上定量测量应变。为了展示每种技术的优缺点,研究了两个由嵌入硅基质中的外延硅锗层组成的样品。然后,从应变精度和准确性、空间分辨率、视场、映射能力以及性能和分析的难易程度等方面对这五种技术进行了比较。

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