Laboratorio MDM, IMM-CNR, Agrate Brianza (MB), Italy.
Nanotechnology. 2013 Jun 21;24(24):245301. doi: 10.1088/0957-4484/24/24/245301. Epub 2013 May 16.
We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71, Mn = 67100 are used. When deposited in the form of thin film, these BCP naturally self-organize upon annealing and form a PS matrix with hexagonally packed PMMA cylinders perpendicularly oriented with respect to the substrate. An accurate study of the confinement of this BCP thin film within isolated trenches is performed as a function of their width (80-260 nm). In this specific configuration the confinement of the BCP thin film within the pre-patterned structures has only been partially achieved. The effect of adjacent trenches on the arrangement of the BCP thin film is investigated using parallel trenches periodically distributed on the surface. The effective confinement of the BCP film is strongly modified by the periodicity of the pre-patterned structures.
我们系统地研究了相邻纳米结构对预图案化沟槽内嵌段共聚物 (BCP) 限制的影响，沟槽位于厚为 100nm 的 SiO2 薄膜中。我们使用的是具有 0.71 苯乙烯分数、Mn = 67100 的不对称 PS-b-PMMA BCP。当以薄膜形式沉积时，这些 BCP 在退火时自然会自组织，并形成一个 PS 基质，其中 PMMA 圆柱以垂直于基底的方式六方紧密排列。我们对这种 BCP 薄膜在孤立沟槽内的限制进行了精确研究，研究了其宽度（80-260nm）的函数关系。在这种特定配置中，BCP 薄膜在预图案化结构内的限制仅部分实现。我们使用周期性分布在表面上的平行沟槽来研究相邻沟槽对 BCP 薄膜排列的影响。周期性预图案化结构强烈地改变了 BCP 薄膜的有效限制。
