Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu, 30013, Taiwan.
Nanotechnology. 2013 Jul 5;24(26):265301. doi: 10.1088/0957-4484/24/26/265301.
Sub-15 nm-wide gratings with a high aspect ratio of up to 16:1 were fabricated using roll-to-roll nanoimprinting and plasma trimming to achieve high optical performance (up to 12 000:1 extinction ratio with an average transmittance of 82%) and low colour shift (transmittance variation less than 3%) flexible wire-grid polarizers for display applications. We applied two imprint platforms onto glass and plastic substrates to identify the optical properties and characteristics of each fabrication process. To enhance the tolerance, reproducibility, and optical performance of the process, the grating profile symmetry and varying residual layer thicknesses were precisely simulated and controlled to achieve the design targets.
采用卷对卷纳米压印和等离子体修整技术，制造出高达 16:1 的高纵横比（高深宽比）的亚 15nm 宽光栅，实现了高光学性能（高达 12000:1 的消光比和平均透光率 82%）和低颜色漂移（透光率变化小于 3%）的柔性线栅偏振器，可用于显示应用。我们在玻璃和塑料基板上应用了两种压印平台，以确定每种制造工艺的光学特性和特点。为了提高工艺的公差、可重复性和光学性能，我们精确地模拟和控制光栅轮廓对称性和变化的残余层厚度，以达到设计目标。
