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二氧化硅中的缺氧中心:多体微扰理论中的光学性质。

Oxygen deficient centers in silica: optical properties within many-body perturbation theory.

机构信息

CEA, DAM, DIF, Bruyères-le-Châtel, F-91297 Arpajon Cedex, France.

出版信息

J Phys Condens Matter. 2013 Aug 21;25(33):335502. doi: 10.1088/0953-8984/25/33/335502. Epub 2013 Jul 23.

DOI:10.1088/0953-8984/25/33/335502
PMID:23877003
Abstract

The electronic and optical properties of neutral oxygen vacancies, also called oxygen deficient centers (ODC(I)s), have been investigated in pure and germanium doped silica (both amorphous and α-quartz) through first-principles calculations. By means of density functional theory and many-body perturbation theory (GW approximation and the solution of the Bethe-Salpeter equation), we obtain the atomic and electronic structures as well as the optical absorption spectra of pure and Ge-doped silica in the presence of ODCs (SiODC(I)s and GeODC(I)s); our study allows us to interpret and explain the very nature of the optical features in experimental absorption spectra. The theoretical optical absorption signatures of these defects show excellent agreement with experiments for the SiODC(I)s, i.e. two absorption bands arise around 7.6 eV due to transitions between the defect levels. Our theoretical results also explain the experimental difficulty in measuring the GeODC(I) absorption band in Ge-doped silica, which was in fact tentatively assigned to a broad and very weak absorption signature, located between 7.5 and 8.5 eV. The influence of Ge-doping induced disorder on the nature of the defect-related optical transitions is discussed. We find that even if the atomic and electronic structures of SiODC(I) and GeODC(I) defects are relatively similar, the slight network distortion induced by the presence of the Ge atom, together with the increase in the Ge-Si bond asymmetry, completely changes the nature of the optical absorption edge.

摘要

通过第一性原理计算,研究了中性氧空位(也称为氧缺陷中心(ODC(I)))在纯二氧化硅和掺锗二氧化硅(非晶态和α-石英)中的电子和光学性质。通过密度泛函理论和多体微扰理论(GW 近似和贝塞耳-萨尔皮特方程的求解),我们获得了纯二氧化硅和掺锗二氧化硅中存在 ODC(SiODC(I)和 GeODC(I))时的原子和电子结构以及光学吸收谱;我们的研究允许我们解释和解释实验吸收谱中光学特征的本质。这些缺陷的理论光学吸收特征与 SiODC(I)的实验非常吻合,即由于缺陷能级之间的跃迁,出现了两个约 7.6 eV 的吸收带。我们的理论结果还解释了实验上难以测量掺锗二氧化硅中 GeODC(I)吸收带的原因,实际上该吸收带被暂定分配给位于 7.5 和 8.5 eV 之间的宽而非常弱的吸收特征。讨论了掺锗诱导无序对缺陷相关光学跃迁性质的影响。我们发现,即使 SiODC(I)和 GeODC(I)缺陷的原子和电子结构相对相似,但由于 Ge 原子的存在引起的轻微网络扭曲,以及 Ge-Si 键的不对称性增加,完全改变了光学吸收边缘的性质。

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