Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, China.
Opt Lett. 2013 Aug 1;38(15):2663-5. doi: 10.1364/OL.38.002663.
An improved type of Dammann grating (DG) that could generate an equal-intensity spot array which has only three phases is proposed. Numerical solutions of 1×4 and 1×5 such DGs are given. A 4×4 two-phase DG manufactured by very-large-scale integration (VLSI) techniques is presented. A phase-shift-interferometry-based technique that measures the intensity and sub-beam phases of beam splitting gratings is proposed. The performance measurements of the manufactured 4×4 two-phase DG using the proposed technique is carried out.
提出了一种改进型的达曼光栅（DG），它可以产生只有三个相位的等强度光斑阵列。给出了 1×4 和 1×5 这样的 DG 的数值解。介绍了一种采用超大规模集成电路（VLSI）技术制造的 4×4 二相 DG。提出了一种基于相移干涉测量技术的测量光束分光光栅强度和子光束相位的方法。利用所提出的技术对制造的 4×4 二相 DG 进行了性能测试。
