氮化硅基质中局域表面等离激元和激子的尺寸相关耦合。

Size-dependent coupling between localized surface plasmons and excitons in silicon nitride matrix.

机构信息

State Key Laboratory of Silicon Materials and Department of Materials Science and Engineering, Zhejiang University, Hangzhou, China.

出版信息

Opt Lett. 2013 Aug 1;38(15):2832-4. doi: 10.1364/OL.38.002832.

DOI:10.1364/OL.38.002832

PMID:23903155

Abstract

The size-dependent coupling between localized surface plasmons (LSPs) and excitons within a silicon nitride (SiN(x)) matrix is investigated. A strong correlation between the photoluminescence (PL) enhancement and this resonance coupling is observed. From the analysis of the relationship between the dipolar resonance peaks of Ag nanostructures with various sizes and those of PL enhancement, we ascribe the enhancement of PL from the SiN(x) matrix by the addition of Ag nanostructures mainly to the LSP resonance coupling.

摘要

研究了局域表面等离激元（LSP）与氮化硅（SiN(x)）基质内激子之间的尺寸相关耦合。观察到光致发光（PL）增强与这种共振耦合之间存在很强的相关性。通过分析具有不同尺寸的 Ag 纳米结构的偶极共振峰与 PL 增强之间的关系，我们将 SiN(x)基质中 Ag 纳米结构添加引起的 PL 增强主要归因于 LSP 共振耦合。