Huang Cheng-Sheng, Wang Wei-Chih
Department of Mechanical Engineering, University of Washington, Seattle, Washington 98195, USA.
Appl Opt. 2013 Aug 1;52(22):5545-51. doi: 10.1364/AO.52.005545.
A polymeric SU8 inverted-rib waveguide Bragg grating filter fabricated using reactive ion etching (RIE) and solvent assisted microcontact molding (SAMIM) is presented. SAMIM is one kind of soft lithography. The technique is unique in that a composite hard-polydimethysiloxane/polydimethysiloxane stamp is used to transfer the grating pattern onto an inverted SU8 rib waveguide system. The composite grating stamp can be used repeatedly several times without degradation. Using this stamp and inverter-rib waveguide structure, the Bragg grating filter fabrication can be significantly simplified. The experiment result shows an attenuation dip in the transmission spectra, with a value of -7 dBm at 1550 nm for a grating with a period of 0.492 μm on an inverted-rib waveguide with 6.6 μm width and 4 μm height.
本文介绍了一种采用反应离子刻蚀（RIE）和溶剂辅助微接触成型（SAMIM）制造的聚合物SU8倒脊波导布拉格光栅滤波器。SAMIM是一种软光刻技术。该技术的独特之处在于，使用复合硬聚二甲基硅氧烷/聚二甲基硅氧烷印章将光栅图案转移到倒SU8脊波导系统上。复合光栅印章可重复使用多次而不会退化。使用这种印章和倒脊波导结构，可以显著简化布拉格光栅滤波器的制造。实验结果表明，在传输光谱中出现了一个衰减凹陷，对于宽度为6.6μm、高度为4μm的倒脊波导上周期为0.492μm的光栅，在1550nm处的值为-7dBm。
