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高质量 GaN 薄膜中与子结构相关的位错的空间分布。

Spatial distribution of dislocations in relation to a substructure in high-quality GaN film.

机构信息

Analytical Engineering Group, Samsung Advanced Institute of Technology, Youngin, Gyeonggi-do 446-712, Korea.

出版信息

Microsc Microanal. 2013 Aug;19 Suppl 5:127-30. doi: 10.1017/S1431927613012488.

Abstract

The dislocation distribution of high-quality single-crystal gallium nitride (GaN) films grown by the hybrid vapor phase epitaxy was analyzed. This study examined the domain structure of GaN from the dislocation distribution on the macroscale by optical microscopy. The surface structure of GaN consisted of domains with microcolumns as the substructure. The inner domains contained a lower density of dislocations but a large number of these dislocations were observed along the domain boundaries. The existence of a domain boundary structure doubly increased the total dislocation density.

摘要

本文分析了采用混合气相外延法生长的高质量 GaN 单晶薄膜的位错分布。通过光学显微镜,从宏观尺度上的位错分布研究了 GaN 的畴结构。GaN 的表面结构由微柱作为亚结构的畴组成。内畴含有较低密度的位错,但观察到大量位错沿畴界存在。畴界结构的存在使总位错密度增加了一倍。

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