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基于涂覆模板-等离子体轰击制备多孔 Ag 空心球阵列。

Fabrication of porous Ag hollow sphere arrays based on coated template-plasma bombardment.

机构信息

Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Chinese Academy of Sciences, Hefei 230031,People's Republic of China.

出版信息

Nanotechnology. 2013 Nov 22;24(46):465302. doi: 10.1088/0957-4484/24/46/465302. Epub 2013 Oct 22.

DOI:10.1088/0957-4484/24/46/465302
PMID:24149083
Abstract

A facile and flexible strategy is presented to produce porous Ag hollow sphere arrays, with a micro/nanostructure and contaminant-free surface, based on a combination of the bottom-up and top-down fabrication strategies, or by plasma bombardment of Ag-coated monolayer polystyrene sphere templates. The arrays consist of periodically arranged micro-sized hollow spheres with nanoscaled pores (mostly within 100 nm) in the shell layer. These arrays are structurally tunable in spherical size (in the sub-10 μm range), spacing (from a few nanometers to several microns), shell thickness (over tens of nanometers) and porous configuration by the template and bombarding conditions. The strategy is universal for the fabrication of other porous metal hollow sphere arrays. Such nanoscaled rough and porous Ag hollow sphere arrays have potential applications in catalysis, antibacterial and photonic devices. The arrays show significant surface-enhanced Raman scattering (SERS) activity (the minimum detectable concentration of the standard molecule rhodamine 6G can be down to 10(-14) M) with good stability and reproduction, and are a good candidate for the substrate of SERS effect based devices.

摘要

一种基于自下而上和自上而下制造策略相结合的方法,或者通过等离子体轰击涂覆有 Ag 的单层聚苯乙烯球模板,提出了一种生产具有微/纳米结构且表面无污染的多孔 Ag 空心球阵列的简单灵活的策略。该阵列由周期性排列的微尺寸空心球组成,壳层中有纳米级的孔(大多数在 100nm 以内)。通过模板和轰击条件,可以在球形尺寸(亚 10μm 范围内)、间距(从几纳米到几微米)、壳层厚度(几十纳米以上)和多孔结构方面对这些阵列进行结构可调。该策略适用于其他多孔金属空心球阵列的制造。这种纳米级粗糙多孔 Ag 空心球阵列在催化、抗菌和光子器件方面具有潜在的应用。该阵列具有显著的表面增强拉曼散射(SERS)活性(标准分子罗丹明 6G 的最低可检测浓度可低至 10^(-14) M),具有良好的稳定性和重现性,是基于 SERS 效应的器件衬底的良好候选材料。

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