Marouli M, Pommé S, Jobbágy V, Van Ammel R, Paepen J, Stroh H, Benedik L
European Commission, Joint Research Centre, Institute for Reference Materials and Measurements, Retieseweg 111, B-2440 Geel, Belgium.
European Commission, Joint Research Centre, Institute for Reference Materials and Measurements, Retieseweg 111, B-2440 Geel, Belgium.
Appl Radiat Isot. 2014 May;87:292-6. doi: 10.1016/j.apradiso.2013.11.020. Epub 2013 Nov 19.
High-resolution alpha-particle spectrometry was performed with an ion-implanted silicon detector in vacuum on a homogeneously electrodeposited (236)U source. The source was measured at different solid angles subtended by the detector, varying between 0.8% and 2.4% of 4π sr, to assess the influence of coincidental detection of alpha-particles and conversion electrons on the measured alpha-particle emission probabilities. Additional measurements were performed using a bending magnet to eliminate conversion electrons, the results of which coincide with normal measurements extrapolated to an infinitely small solid angle. The measured alpha emission probabilities for the three main peaks - 74.20 (5)%, 25.68 (5)% and 0.123 (5)%, respectively - are consistent with literature data, but their precision has been improved by at least one order of magnitude in this work.
使用离子注入硅探测器在真空中对均匀电沉积的(236)U源进行了高分辨率α粒子能谱分析。在探测器所张的不同立体角下对源进行测量，立体角在4π sr的0.8%至2.4%之间变化，以评估α粒子与转换电子的符合探测对测量的α粒子发射概率的影响。使用弯曲磁铁进行了额外测量以消除转换电子，其结果与外推到无限小立体角的常规测量结果一致。三个主峰的测量α发射概率分别为74.20(5)%、25.68(5)%和0.123(5)%，与文献数据一致，但在本工作中其精度至少提高了一个数量级。
