Lehrstuhl für Botanik, Technische Universität München, Arcisstraße 21, D-8000, München 2, Federal Republic of Germany.
Planta. 1979 Jan;145(4):383-7. doi: 10.1007/BF00388365.
In broken spinach chloroplasts the total amount of thiol groups is about 3.7 μmol mg(-1) chlorophyll. Two thirds are represented by the masked form (which is only titratable after unfolding of the protein). Of the free groups, those reacting with NBD·Cl (1.2-2.0 μmol mg(-1) chlorophyll) seem to be undergoing oxidation more readily than those reacting with DTNB (1.0 μmol mg(-1) chlorophyll). SO2 application causes a maximal increase of 25% in free thiols, and doubles the amount of the masked thiols. The light triggered increase in SH, which starts at an elevated level, runs parallel to that of the controls. SO2 application of 1.8 mg m(-3) (=28 nmol l(-1)) for 1 h does not affect the dark level of NADP-GPD but enhances the light modulation by increasing the ratio of activation. This enhancement is explained by an increase in masked thiol groups during the preceding fumigation period.
在破损的菠菜叶绿体中,巯基总量约为 3.7 μmol mg(-1)叶绿素。其中三分之二以被掩蔽的形式存在(只有在蛋白质展开后才能滴定)。在游离巯基中,与 NBD·Cl 反应的(1.2-2.0 μmol mg(-1)叶绿素)似乎比与 DTNB 反应的(1.0 μmol mg(-1)叶绿素)更容易发生氧化。SO2 处理可使游离巯基最大增加 25%,并使掩蔽巯基的含量增加一倍。在光照下,SH 开始时就处于升高水平,与对照物的升高水平平行。以 1.8 mg m(-3)(=28 nmol l(-1))的 SO2 处理 1 小时,不会影响 NADP-GPD 的暗水平,但通过增加激活比来增强光调节。这种增强是通过在前一个熏蒸期内增加掩蔽巯基来解释的。