Kondo S, Satoh Y, Kuroki T
Mutat Res. 1987 Jan;183(1):95-101. doi: 10.1016/0167-8817(87)90050-2.
DNA repair synthesis in 8 explant-outgrowth cultures of epidermal cells isolated from variant and complementation groups A and E of xeroderma pigmentosum (XP) was examined by measuring unscheduled DNA synthesis (UDS) on autoradiographs. The extents of UDS in XP epidermal cells were compared with those in normal epidermal cells obtained from 26 subjects. In both normal and XP epidermal cells, UDS was induced dose-dependently by radiation at doses of 5-20 J/m2. XP epidermal cells showed various extents of defect in DNA repair depending on the type of XP. In XP-A, the extent of UDS in epidermal cells was very low, being seen in only 3-10% of the normal epidermal cells. But epidermal cells isolated from XP-E and XP-variants exhibited relatively high levels of residual DNA repair; i.e., 69-84% of the control in XP-E and 67-85% in XP-variant. The extents of UDS in XP epidermal cells were almost the same as those in fibroblastic cells isolated from the same specimens.
通过测量放射自显影片上的非预定DNA合成(UDS),对从色素性干皮病(XP)A组和E组的变异型和互补型中分离出的8种表皮细胞外植体生长培养物中的DNA修复合成进行了检测。将XP表皮细胞中的UDS程度与从26名受试者获得的正常表皮细胞中的UDS程度进行了比较。在正常和XP表皮细胞中,5-20 J/m2剂量的辐射均剂量依赖性地诱导UDS。XP表皮细胞根据XP的类型表现出不同程度的DNA修复缺陷。在XP-A中,表皮细胞中的UDS程度非常低,仅在3-10%的正常表皮细胞中可见。但是从XP-E和XP变异型中分离出的表皮细胞表现出相对较高水平的残留DNA修复;即,XP-E中为对照的69-84%以及XP变异型中为67-85%。XP表皮细胞中的UDS程度与从相同标本中分离出的成纤维细胞中的UDS程度几乎相同。