Opt Lett. 2014 Jan 1;39(1):170-3. doi: 10.1364/OL.39.000170.
We report on an 800 nm center-wavelength metal/multilayer-dielectric grating (MMDG) with broadband, high diffraction efficiency. The trapezoidal grating ridge consists of an HfO2 layer sandwiched between two SiO2 films. Combining the advantages of SiO2 and HfO2, the grating ridge reduces the difficulties of grating ridge attainment. For such a configuration, high-performance MMDG can be successfully fabricated using the existing technology. Experimentally we demonstrated a 163 nm bandwidth MMDG with -1st-order diffraction efficiency greater than 90%. The fabricated MMDG achieved high performance as the design with large fabrication tolerances.
我们报告了一种具有宽带、高光衍射效率的 800nm 中心波长金属/多层介质光栅(MMDG)。梯形光栅脊由夹在两个 SiO2 薄膜之间的 HfO2 层组成。结合 SiO2 和 HfO2 的优点,光栅脊降低了获得光栅脊的难度。对于这种结构,可以使用现有技术成功制造出高性能的 MMDG。实验上,我们展示了一种带宽为 163nm 的 MMDG,其-1 阶衍射效率大于 90%。所制造的 MMDG 实现了高性能,因为它具有较大的制造容差的设计。