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镓掺杂氧化铟纳米线相变随机存取存储器单元

Ga-doped indium oxide nanowire phase change random access memory cells.

作者信息

Jin Bo, Lim Taekyung, Ju Sanghyun, Latypov Marat I, Kim Hyoung Seop, Meyyappan M, Lee Jeong-Soo

机构信息

Division of IT-Convergence Engineering, Pohang University of Science and Technology, Pohang, Republic of Korea.

出版信息

Nanotechnology. 2014 Feb 7;25(5):055205. doi: 10.1088/0957-4484/25/5/055205. Epub 2014 Jan 9.

Abstract

Phase change random access memory (PCRAM) devices are usually constructed using tellurium based compounds, but efforts to seek other materials providing desirable memory characteristics have continued. We have fabricated PCRAM devices using Ga-doped In2O3 nanowires with three different Ga compositions (Ga/(In+Ga) atomic ratio: 2.1%, 11.5% and 13.0%), and investigated their phase switching properties. The nanowires (∼40 nm in diameter) can be repeatedly switched between crystalline and amorphous phases, and Ga concentration-dependent memory switching behavior in the nanowires was observed with ultra-fast set/reset rates of 80 ns/20 ns, which are faster than for other competitive phase change materials. The observations of fast set/reset rates and two distinct states with a difference in resistance of two to three orders of magnitude appear promising for nonvolatile information storage. Moreover, we found that increasing the Ga concentration can reduce the power consumption and resistance drift; however, too high a level of Ga doping may cause difficulty in achieving the phase transition.

摘要

相变随机存取存储器(PCRAM)器件通常使用碲基化合物构建,但寻找具有理想存储特性的其他材料的工作仍在继续。我们使用具有三种不同镓成分(镓/(铟+镓)原子比:2.1%、11.5%和13.0%)的镓掺杂氧化铟纳米线制造了PCRAM器件,并研究了它们的相变特性。这些纳米线(直径约40纳米)可以在晶相和非晶相之间反复切换,并且观察到纳米线中存在镓浓度依赖性的存储切换行为,其超快的设置/重置速率为80纳秒/20纳秒,比其他有竞争力的相变材料更快。快速的设置/重置速率以及具有两到三个数量级电阻差异的两种不同状态的观察结果对于非易失性信息存储似乎很有前景。此外,我们发现增加镓浓度可以降低功耗和电阻漂移;然而,过高的镓掺杂水平可能会导致实现相变困难。

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