Lehrstuhl für Biochemie der Pflanzen, Ruhr-Universität Bochum, D-4630, Bochum, Germany.
Photosynth Res. 1992 Nov;34(2):311-7. doi: 10.1007/BF00033448.
A herbicide resistant Chlamydomonas double mutant (I219A264) has been obtained by transforming the psbA deletion mutant FuD7 with a cloned psbA gene fragment containing mutations in codons 219 and 264. Copies from both the recipient (FuD7) genome and the genome carrying the mutated psbA gene persist in the transformant. This stable heteroplasmic state appears to be required for photoautotrophic growth. Comparison of resistance profiles for classical and phenol-type inhibitors of the double mutant and the corresponding single mutants demonstrates independent, additive contributions of both amino acids to herbicide binding. The approach chosen here to modify the psbA gene should be useful in those cases where consequences of psbA gene manipulations are not predictable with respect to inhibitor resistance.
已通过用含有密码子 219 和 264 突变的 psbA 基因片段转化 psbA 缺失突变体 FuD7 获得了抗除草剂的衣藻双突变体(I219A264)。转化体中既有受体(FuD7)基因组的拷贝,也有携带突变 psbA 基因的基因组的拷贝。这种稳定的异质质体状态似乎是光自养生长所必需的。对双突变体和相应的单突变体的经典和酚型抑制剂的抗性谱的比较表明,两种氨基酸对除草剂结合都有独立的、累加的贡献。这里选择的修饰 psbA 基因的方法在那些 psbA 基因操作的后果对于抑制剂抗性不可预测的情况下应该是有用的。