Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu Science Park, Hsinchu 300, Taiwan.
Nanoscale Res Lett. 2014 Jan 16;9(1):35. doi: 10.1186/1556-276X-9-35.
Conductive and transparent multilayer thin films consisting of three alternating layers (TiO2/Ag/SiO2, TAS) have been fabricated for applications as transparent conducting oxides. Metal oxide and metal layers were prepared by electron-beam evaporation with ion-assisted deposition, and the optical and electrical properties of the resulting films as well as their energy bounding characteristics and microstructures were carefully investigated. The optical properties of the obtained TAS material were compared with those of well-known transparent metal oxide glasses such as ZnO/Ag/ZnO, TiO2/Ag/TiO2, ZnO/Cu/ZnO, and ZnO/Al/ZnO. The weathering resistance of the TAS film was improved by using a protective SiO2 film as the uppermost layer. The transmittance spectra and sheet resistance of the material were carefully measured and analyzed as a function of the layer thickness. By properly adjusting the thickness of the metal and dielectric films, a low sheet resistance of 6.5 ohm/sq and a high average transmittance of over 89% in the 400 to 700 nm wavelength regions were achieved. We found that the Ag layer played a significant role in determining the optical and electrical properties of this film.
由三层交替层（TiO2/Ag/SiO2，TAS）组成的导电透明多层薄膜已被制备用于透明导电氧化物的应用。金属氧化物和金属层通过电子束蒸发和离子辅助沉积制备，仔细研究了所得薄膜的光学和电学性质以及它们的能量结合特性和微观结构。将获得的 TAS 材料的光学性质与 ZnO/Ag/ZnO、TiO2/Ag/TiO2、ZnO/Cu/ZnO 和 ZnO/Al/ZnO 等知名透明金属氧化物玻璃的光学性质进行了比较。通过使用保护性 SiO2 薄膜作为最上层，提高了 TAS 薄膜的耐候性。仔细测量和分析了材料的透光率谱和方阻随层厚的变化。通过适当调整金属和介电薄膜的厚度，可以实现低方阻 6.5 欧姆/平方和在 400 到 700nm 波长区域的平均透光率超过 89%。我们发现 Ag 层在确定该薄膜的光学和电学性质方面起着重要作用。
