基于 Eu3+:Y2SiO5 中光谱烧孔的光学频率基准的绝对和相对稳定性。

Absolute and relative stability of an optical frequency reference based on spectral hole burning in Eu3+:Y2SiO5.

机构信息

National Institute of Standards and Technology, 325 Broadway Street, Boulder, Colorado 80305, USA.

出版信息

Phys Rev Lett. 2013 Dec 6;111(23):237402. doi: 10.1103/PhysRevLett.111.237402. Epub 2013 Dec 3.

DOI:10.1103/PhysRevLett.111.237402

Abstract

We present and analyze four frequency measurements designed to characterize the performance of an optical frequency reference based on spectral hole burning in Eu3+:Y2SiO5. The first frequency comparison, between a single unperturbed spectral hole and a hydrogen maser, demonstrates a fractional frequency drift rate of 5×10(-18) s(-1). Optical frequency comparisons between a pattern of spectral holes, a Fabry-Pérot cavity, and an Al(+) optical atomic clock show a short-term fractional frequency stability of 1×10(-15)τ(-1/2) that averages down to 2.5(-0.5)(+1.1)×10(-16) at τ=540 s (with linear frequency drift removed). Finally, spectral-hole patterns in two different Eu(3+):Y2SiO(5) crystals located in the same cryogenic vessel are compared, yielding a short-term stability of 7×10(-16)τ(-1/2) that averages down to 5.5(-0.9)(+1.8)×10(-17) at τ=204 s (with quadratic frequency drift removed).

摘要

我们提出并分析了四个频率测量，旨在表征基于 Eu3+:Y2SiO5 中光谱烧孔的光学频率基准的性能。第一次频率比较是在单个未受干扰的光谱孔和氢激射器之间进行的，证明了分数频率漂移率为 5×10(-18) s(-1)。光谱孔图案、法布里-珀罗腔和 Al(+)光学原子钟之间的光学频率比较显示，短期分数频率稳定性为 1×10(-15)τ(-1/2)，在 τ=540 s 时平均降至 2.5(-0.5)(+1.1)×10(-16)（去除线性频率漂移）。最后，位于同一低温容器中的两个不同 Eu(3+):Y2SiO(5)晶体中的光谱孔图案进行了比较，在 τ=204 s 时，短期稳定性为 7×10(-16)τ(-1/2)，平均降至 5.5(-0.9)(+1.8)×10(-17)（去除二次频率漂移）。